Titanium ( Ti ) sputtering targets are widely utilized in thin-film deposition processes due to their exceptional properties. Ti possesses a high resilience, excellent stability, and remarkable functionality. These qualities make Ti sputtering targets ideal for a variety of applications in industries such as electronics. Common applications includ

Gold sputtering targets are essential components in various thin-film deposition processes, owing to their exceptional attributes. These targets, often made of high-purity gold, are used in a sputtering system to generate an ionized plasma that deposits a thin layer of gold onto a substrate. The resulting gold films exhibit remarkable durability, m